Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings

• Autoři: MIKULÍK Petr; JERGEL M.; BAUMBACH T.; MAJKOVÁ E.; PINČÍK E.; LUBY Š.; ORTEGA L.; TUCOULOU R.; HUDEK P.; KOSTIČ I.
• Rok publikování: 2001
• Druh: Článek v odborném periodiku
• Časopis / Zdroj: J. Phys. D: Appl. Phys.
• Fakulta / Pracoviště MU: Přírodovědecká fakulta
• www: http://www.sci.muni.cz/~mikulik/Publications.html#MikulikJergelBaumbachMPLOTHK-JPD-2001
• Obor: Fyzika pevných látek a magnetismus
• Klíčová slova: reflectivity; xrr; x-uv optics; gratings; w/si; x-ray
• Popis: Structural characterization of a fully etched amorphous W/Si multilayer grating with a lateral periodicity of 800 nm is performed by x-ray reflectivity in the coplanar and non-coplanar modes using a scintillation detector and a two-dimensional gas-filled detector, respectively. Three-dimensional reciprocal space constructions were used to explain the scattering features recorded in both geometries. Coplanar coherent grating truncation rods were fitted by a dynamical theory for rough gratings. Comparison of the reflectivity from the reference planar multilayer completes the study.

Související projekty

• Laboratoř tenkých vrstev a nanostruktur
• Studium morfologie rozhraní epitaxních multivrstev RTG reflexí