Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge

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Publikace nespadá pod Fakultu sportovních studií, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
Název česky Plazmové čištění a aktivace povrchu křemíku v Dielektrická koplanární Odvody bariérového
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PAMREDDY Annapurna SKÁCELOVÁ Dana HANIČINEC Martin SŤAHEL Pavel STUPAVSKÁ Monika ČERNÁK Mirko HAVEL Josef

Rok publikování 2013
Druh Článek v odborném periodiku
Časopis / Zdroj Surface & coatings technology
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://www.sciencedirect.com/science/article/pii/S0257897213009420
Doi http://dx.doi.org/10.1016/j.surfcoat.2013.10.008
Obor Analytická chemie, separace
Klíčová slova DCSBD plasma; plasma treatment; surface treatment; silicon wafer; LDI
Popis Surface of crystalline silicon (c-Si) wafers was treated in dielectric barrier discharge and the cleaning effect, wettability and adhesion of gold nanoparticles were investigated. Treatment of c-Si was realised in air plasma at atmospheric pressure in Diffuse Coplanar Surface Barrier Discharge (DCSBD). Plasma cleaning and gold nanoparticles adhesion were investigated by means of Laser Desorption Ionisation Time Of Flight Mass Spectrometry (LDI TOF MS) and X-ray photoelectron spectroscopy (XPS). Wettability and surface morphology were studied by contact angle measurement and atomic force microscopy, respectively. By laser desorption in positive ion mode, Cn+ and Na+, K+, etc. ions were detected on the industrially cleaned surface of silicon wafers. After plasma treatment the substantial decrease of such ions was observed. Plasma treatment of the surface increased also its hydrophilicity and adsorption of gold nanoparticles on the Si surface significantly increased after 5 sec cleaning in plasma. Intensity of gold clusters Aun+ absorbed on the plasma treated Si surface was in order of magnitude higher than intensity of clusters absorbed on the untreated surface.
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