Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge

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Authors

PAMREDDY Annapurna SKÁCELOVÁ Dana HANIČINEC Martin SŤAHEL Pavel STUPAVSKÁ Monika ČERNÁK Mirko HAVEL Josef

Year of publication 2013
Type Article in Periodical
Magazine / Source Surface & coatings technology
MU Faculty or unit

Faculty of Science

Citation
Web http://www.sciencedirect.com/science/article/pii/S0257897213009420
Doi http://dx.doi.org/10.1016/j.surfcoat.2013.10.008
Field Analytic chemistry
Keywords DCSBD plasma; plasma treatment; surface treatment; silicon wafer; LDI
Description Surface of crystalline silicon (c-Si) wafers was treated in dielectric barrier discharge and the cleaning effect, wettability and adhesion of gold nanoparticles were investigated. Treatment of c-Si was realised in air plasma at atmospheric pressure in Diffuse Coplanar Surface Barrier Discharge (DCSBD). Plasma cleaning and gold nanoparticles adhesion were investigated by means of Laser Desorption Ionisation Time Of Flight Mass Spectrometry (LDI TOF MS) and X-ray photoelectron spectroscopy (XPS). Wettability and surface morphology were studied by contact angle measurement and atomic force microscopy, respectively. By laser desorption in positive ion mode, Cn+ and Na+, K+, etc. ions were detected on the industrially cleaned surface of silicon wafers. After plasma treatment the substantial decrease of such ions was observed. Plasma treatment of the surface increased also its hydrophilicity and adsorption of gold nanoparticles on the Si surface significantly increased after 5 sec cleaning in plasma. Intensity of gold clusters Aun+ absorbed on the plasma treated Si surface was in order of magnitude higher than intensity of clusters absorbed on the untreated surface.
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