Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes

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Authors	DVOŘÁK Pavel ŽEMLIČKA Radek VAŠINA Petr BURŠÍKOVÁ Vilma
Year of publication	2011
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes.
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