Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process

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Authors	VAŠINA Petr HYTKOVÁ Tereza ELIÁŠ Marek
Year of publication	2008
Type	Article in Proceedings
Conference	Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	hysteresis; reactive sputtering
Description	Theoretical study of role of neutral gas temperature on hysteresis behaviour of reactive sputtering deposition process
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition