Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Proceedings |
| Conference | 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.escampig2008.csic.es/ |
| Field | Plasma physics |
| Keywords | magnetron; reactive sputtering; plasma; discharge; higher harmonics; |
| Description | The fundamental and the higher harmonics of the cathode voltage and of the uncompensated probe potential were used as a tool to control the reactive magnetron sputtering. It was shown that this methode is very sensitive and is suitable for the control of the deposition process. |
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