Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process

Investor logo

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

DVOŘÁK Pavel VAŠINA Petr

Year of publication 2008
Type Article in Proceedings
Conference 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts
MU Faculty or unit

Faculty of Science

Citation
Web http://www.escampig2008.csic.es/
Field Plasma physics
Keywords magnetron; reactive sputtering; plasma; discharge; higher harmonics;
Description The fundamental and the higher harmonics of the cathode voltage and of the uncompensated probe potential were used as a tool to control the reactive magnetron sputtering. It was shown that this methode is very sensitive and is suitable for the control of the deposition process.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info