UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction

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Authors	VALTR Miroslav KLAPETEK Petr OHLÍDAL Ivan FRANTA Daniel
Year of publication	2007
Type	Article in Periodical
Magazine / Source	Optoelectronics and Advanced Materials - Rapid Communications
MU Faculty or unit	Faculty of Science
Citation
Web	http://inoe.inoe.ro/oam-rc/
Field	Plasma physics
Keywords	Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
Description	UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.
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