Měření nanodrsnosti pomocí optických metod a mikroskopie atomové síly
| Title in English | Measurement of nanoroughness using optical methods and atomic force microscopy |
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| Authors | |
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | Kvalita a GPS 2005 |
| MU Faculty or unit | |
| Citation | |
| Web | http://hydra.physics.muni.cz/~franta/bib/KGPS05_131.html |
| Field | Solid matter physics and magnetism |
| Keywords | Drsnost; AFM; Elipsometrie; Odrazivost |
| Description | In this contribution a review of statistical quantities characterizing randomly rough surfaces that are important from the point of view of practice is presented. Furthermore, methods of measuring these quantities by means of atomic force microscopy and optical method based on combination of spectroscopic ellipsometry and spectroscopic reflectometry are described. These methods are illustrated through the results achieved for randomly rough surfaces of silicon single crystal and rough upper boundaries of thin films of TiO2. The results obtained for both the rough surfaces using the combined optical method and atomic force microscopy are mutually compared. A discussion of errors influencing the values of the statistical quantities determined by atomic force microscopy is also carried out. In this contribution we will moreover show that by means of both the mentioned experimental techniques one can even perform a quantitative analysis of the randomly rough surfaces exhibiting nanometric character, i.e. the surfaces whose height irregularities are described by the standard deviations smaller than 10 nm. Simultaneously, we will also present that in the case of the nanometric surfaces it is necessary to expect evident differences in values of their statistical quantities determined using atomic force microscopy on the one hand and combined optical method on the other hand. |
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