Reduction of transient regime in fast preionized high power pulsed magnetron discharge

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Authors

VAŠINA Petr MEŠKO Marcel GANCIU Mihai BRETAGNE Jean BOISSE-LAPORTE Caroline DE POUCQUES Ludovic TOUZEAU Michel

Year of publication 2005
Type Article in Periodical
Magazine / Source Europhysics Letters
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords pulsed magnetron; sputtering; preionization
Description A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He bufer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported.
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