Low temperature temporal and spatial atomic layer deposition of TiO2 films

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Authors

AGHAEE Morteza MAYDANNIK Philipp JOHANSSON Petri KUUSIPALO Jurkka CREATORE Mariadriana HOMOLA Tomáš CAMERON David Campbell

Year of publication 2015
Type Article in Periodical
Magazine / Source Journal of Vacuum Science & Technology A
MU Faculty or unit

Faculty of Science

Citation
Web http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588
Doi http://dx.doi.org/10.1116/1.4922588
Field Solid matter physics and magnetism
Keywords ALD
Description Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants.
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