Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

Varování

Publikace nespadá pod Fakultu sportovních studií, ale pod Středoevropský technologický institut. Oficiální stránka publikace je na webu muni.cz.
Autoři

ZAJÍČKOVÁ Lenka JELÍNEK Petr OBRUSNÍK Adam VODÁK Jiří NEČAS David

Rok publikování 2017
Druh Článek v odborném periodiku
Časopis / Zdroj Plasma Physics and Controlled Fusion
Fakulta / Pracoviště MU

Středoevropský technologický institut

Citace
www http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
Doi http://dx.doi.org/10.1088/1361-6587/aa52e7
Klíčová slova PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy
Popis In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.
Související projekty:

Používáte starou verzi internetového prohlížeče. Doporučujeme aktualizovat Váš prohlížeč na nejnovější verzi.

Další info