Deposition of Zn-containing films using atmospheric pressure plasma jet

• Autoři: GALMIZ Oleksandr; STUPAVSKÁ Monika; WULFF Harm; KERSTEN Holger; BRABLEC Antonín; ČERNÁK Mirko
• Rok publikování: 2014
• Druh: Článek v odborném periodiku
• Časopis / Zdroj: Open chemistry
• Fakulta / Pracoviště MU: Přírodovědecká fakulta
• www: https://doi.org/10.1515/chem-2015-0020
• Doi: http://dx.doi.org/10.1515/chem-2015-0020
• Obor: Fyzika plazmatu a výboje v plynech
• Klíčová slova: Atmospheric pressure plasma jet; film deposition; zinc.
• Popis: The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed

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• CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
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