Effect of plasma treatment on the surface morphology and wettability of (111) and (100) silicon wafers

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Authors

SKÁCELOVÁ Dana HANIČINEC Martin SŤAHEL Pavel ČERNÁK Mirko

Year of publication 2011
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description This paper is focused on the plasma treatment of silicon surface. The effect of plasma treatment in dependence of the different crystallographic orientation of silicon surface,(100) plane and (111) plane is compare
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