Wireless temperature measurement in the hot filament CVD reactor for deposition of carbon nanotubes

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Authors	KOLMAČKA Michal KADLEČÍKOVÁ Magdaléna BREZA Juraj LAZIŠŤAN Filip ZAJÍČKOVÁ Lenka ELIÁŠ Marek JESENÁK Karol PASTORKOVÁ Katarína
Year of publication	2009
Type	Article in Periodical
Magazine / Source	Journal of Electrical Engineering
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	carbon nanotubes; chemical vapour deposition; isolation amplifier
Description	The experimental work deals with measuring the temperature in the hot filament chemical vapour deposition (HF CVD) reactor by a purpose-built electronic circuit. The objective is to optimize the substrate temperature, one of the key technological parameters in the synthesis of carbon nanotubes. The main outcome of the work is the design and construction of a functional thermometer, its precision calibration and improved accuracy of temperature measurement.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Plasma enhanced chemical vapor deposition of carbon nanotubes Preparation of carbon nanostructures by CVD and their characterization