Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously

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Authors

VAŠINA Petr SCHMIDTOVÁ Tereza

Year of publication 2009
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously, proceeding
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