Towards limits of x-ray specular reflectivity

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Authors

JÍŠA Jan MEDUŇA Mojmír

Year of publication 2009
Type Article in Periodical
Magazine / Source Materials Structure in Chemistry, Biology, Physics and Technology
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords x-ray reflectivity; fourier transform; photoresist
Description Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
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