Towards limits of x-ray specular reflectivity

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Authors	JÍŠA Jan MEDUŇA Mojmír
Year of publication	2009
Type	Article in Periodical
Magazine / Source	Materials Structure in Chemistry, Biology, Physics and Technology
MU Faculty or unit	Faculty of Science
Citation
Field	Solid matter physics and magnetism
Keywords	x-ray reflectivity; fourier transform; photoresist
Description	Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
Related projects:	Physical and chemical properties of advanced materials and structures Nucleation and growth of oxygen precipitates in silicon