Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously

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Authors

VAŠINA Petr SCHMIDTOVÁ Tereza

Year of publication 2009
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously, proceeding
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