Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Proceedings |
| Conference | ORGANIC/INORGANIC HYBRID MATERIALS - 2007 |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | THIN-FILMS; HYBRID; DEPOSITION; SILICA; MODEL |
| Description | Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O-2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests. |
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