Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

ZAJÍČKOVÁ Lenka KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma FRANTA Daniel PEŘINA Vratislav MACKOVÁ Anna

Year of publication 2008
Type Article in Proceedings
Conference ORGANIC/INORGANIC HYBRID MATERIALS - 2007
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords THIN-FILMS; HYBRID; DEPOSITION; SILICA; MODEL
Description Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O-2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info