Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

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Authors	VAŠINA Petr SCHMIDTOVÁ Tereza ELIÁŠ Marek
Year of publication	2009
Type	Article in Periodical
Magazine / Source	Plasma Sources Science and Technology
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	magnetron sputtering; reactive; Berg
Description	The paper model reactive magnetron sputtering deposition process by modified Bergs model. We test also role of different temperature conditions on hysteresys behaviour and role of non-uniform discharge current density.
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