Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces

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Authors

LEHOCKÝ Marian SŤAHEL Pavel KOUTNÝ Marek ČECH Jan INSTITORIS Jakub MRÁČEK Aleš

Year of publication 2008
Type Article in Periodical
Magazine / Source Journal of Materials Processing Technology
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Rhodococcus; Plasma deposition; Cell adhesion; Barrier discharge; Thin films
Description Investigation of Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 adhesion to hydrophobic teflon like films and organosilicon films deposited on the paper substrate.
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