Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	VAŠINA Petr DVOŘÁK Pavel
Year of publication	2009
Type	Article in Proceedings
Conference	Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	reactive sputtering
Description	Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process, proceeding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition