Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition

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Authors	BURSIKOVA Vilma VALTR Miroslav KLAPETEL Petr BURSIK Jiri BLAHOVA Olga OHLIDAL Ivan
Year of publication	2008
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	In the past two decades, there is a great industrial interest in preparation of amorphous hydrogenated carbon (a-C:H) thin films in a wide range of applications such as nanoelectronics, optical devices, integrated digital circuits, micro-electromechanical devices (MEMs), biomedical coatings, etc. The mechanical properties such as hardness, wear resistance, fracture toughness, film-substrate adhesion, thermo-mechanical stability of the coating-substrate system play always a crucial role for industrial applications of the films.
Related projects:	Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges Nanometrologie využívající metod rastrovací sondové mikroskopie