Optical Characterization of Ultrananocrystalline Diamond Films

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Authors

FRANTA Daniel ZAJÍČKOVÁ Lenka KARÁSKOVÁ Monika JAŠEK Ondřej NEČAS David KLAPETEK Petr VALTR Miroslav

Year of publication 2008
Type Article in Periodical
Magazine / Source Diamond and Related Materials
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords Nanocrystalline carbon; Optical properties characterization; Band structure
Description Optical properties of the ultrananocrystalline diamond films were studied by multisample method based on the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry applied in the range 0.6-6.5 eV. The films were deposited by PECVD in a conventional bell jar (ASTeX type) reactor using dual frequency discharge, microwave cavity plasma and radio frequency plasma inducing dc self-bias at a substrate holder. The optical model of the samples included a surface roughness described by the Rayleigh-Rice theory and a refractive index profile in which Drude approximation was used. The results conformed with the present understanding of the polycrystalline diamond growth on the silicon substrate because the existence of silicon carbide and amorphous hydrogenated carbon film between the silicon substrate and nucleation layer was proved.
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