Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering

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Authors	ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr
Year of publication	2008
Type	Article in Proceedings
Conference	Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	hybrid deposition process; hysteresis
Description	Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering, proceeding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition