DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHEREIN N2 + HMDSO + O2 ATMOSPHERE

Investor logo

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.
Title in English DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE
Authors

STUDNIČKA Filip TRUNEC David SŤAHEL Pavel BURŠÍKOVÁ Vilma KELAR Lukáš

Year of publication 2008
Type Article in Periodical
Magazine / Source Chemické Listy, II Central European Symposium on Plasma Chemistry 2008
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords plasma deposition
Description The aim of the work was to study the deposition of thin films in ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 atmosphere. The mechanical properties of films were studied by indentation techniques. The films exhibited hardnes in the range from 0.5 to 7 GPa depending on the deposition conditions.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info