DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHEREIN N2 + HMDSO + O2 ATMOSPHERE

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Title in English	DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE
Authors	STUDNIČKA Filip TRUNEC David SŤAHEL Pavel BURŠÍKOVÁ Vilma KELAR Lukáš
Year of publication	2008
Type	Article in Periodical
Magazine / Source	Chemické Listy, II Central European Symposium on Plasma Chemistry 2008
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	plasma deposition
Description	The aim of the work was to study the deposition of thin films in ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 atmosphere. The mechanical properties of films were studied by indentation techniques. The films exhibited hardnes in the range from 0.5 to 7 GPa depending on the deposition conditions.
Related projects:	Deposition of thin films in dielectric barrier discharges at atmospheric pressure