Relationship between the nanoindentation response of amorphous carbon thin films and the depth profile of their structure
| Authors | |
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| Year of publication | 2008 |
| Type | Article in Proceedings |
| Conference | International Balkan Workshop on Applied Physics - Book of abstracts |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Description | The aim of this work is to characterize the amorphous carbon thin films by nanoindentation and to compare the properties of such films deposited using techniques like low pressure radio frequency plasma enhanced chemical vapor deposition (PECVD) and thermionic vacuum arc (TVA). The depositions were made on steel and single crystalline silicon substrates. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion. The purpose of this work is to obtain information regarding the film structure depth profile only from the nanoindentation testing response. The mechanical tests were performed using continuous stiffness measurement (CSM) by Nanoindenter XP, depth sensing indentation by Fisherscope H100 tester, and dynamic mechanical analysis (DMA) by ultra nano hardness tester (UNHT). Moreover, we studied the effect of the internal stress on the indentation response of the film-substrate systems. The morphology of the film surface before and after indentation tests was examined using scanning electron and atomic force microscopy (SEM, AFM) and by optical microscope in Nomarski contrast and in polarized light. |
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