Characterization of near field optical microscope probes
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Periodical |
| Magazine / Source | Surface and Interface Analysis |
| MU Faculty or unit | |
| Citation | |
| Field | Optics, masers and lasers |
| Keywords | near field scanning optical microscopy;image artefacts;optical analysis |
| Description | In this article the far-field radiation analysis of near-field optical probes is presented. It is shown that the quality of probes used for near-field scanning microscopy imaging can be estimated using directional measurements of the far-field radiation patterns. Experimental results are compared with numerical modeling of far-field radiation performed using finite difference in time-domain method (FDTD) and with SEM characterization of real probe geometry. The effects of probe geometry on real measurement on different samples are studied as well. |
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