Structure and properties of carbon thin film deposited using Thermionic Vacuum Arc (TVA) methode

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	VLADOIU R. MUSA G. CIUPINA V. BURŠÍKOVÁ Vilma
Year of publication	2007
Type	Article in Proceedings
Conference	Absracts and full papers 18th ISPC
MU Faculty or unit	Faculty of Science
Citation	VLADOIU, R., G. MUSA, V. CIUPINA and Vilma BURŠÍKOVÁ. Structure and properties of carbon thin film deposited using Thermionic Vacuum Arc (TVA) methode. In Absracts and full papers 18th ISPC. Kyoto, Japan: Kyoto University, 2007, p. 1-4. ISBN 978-9903773-2-8.
Field	Plasma physics
Keywords	TVA;carbon;mechanical properties
Description	Structure and properties of carbon thin film deposited using Thermionic Vacuum Arc (TVA) methode
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Multiscale approach to relationships between mechanical and microstructural characteristics of materials