Deposition of thin films on glass substrate in atmospheric pressure glow discharge
| Authors | |
|---|---|
| Year of publication | 2007 |
| Type | Article in Proceedings |
| Conference | Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | atmospheric pressure glow discharge; thin films |
| Description | The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound (hexamethyldisiloxane HMDSO) which was used as a monomer. Thin films was deposited on the glass substrate. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of Xray Photoelectron Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range. The comparison with thin films deposited on the silicon substrate is provided. |
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