Study of thickness reduction of a-C:H thin film under UV light irradiation

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Authors

VALTR Miroslav KLAPETEK Petr OHLÍDAL Ivan DUCHOŇ Václav

Year of publication 2007
Type Article in Proceedings
Conference Proceedings of ICPIG XXVIII Conference
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Carbon; Oxidation; Optical Properties
Description In this paper we present a study of thickness reduction of an amorphous hydrocarbon (a-C:H) thin film under UV light irradiation. Optical parameters of the film are examined by means of spectroscopic ellipsometry and area reflectance measurement. We observed a linear dependence in thickness reduction. The reduction velocity is 10.1 nm/h in this region. However, if the thickness of the film was less then approx. 14 nm, the reduction velocity decreases subsequently. Area reflectance measurement consisting in taking reflectance spectra in many points lying along the area of the sample is used to create a map with thickness distribution along this area. This method is very sensitive to small thickness variations.
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