Study of thickness reduction of a-C:H thin film under UV light irradiation
| Authors | |
|---|---|
| Year of publication | 2007 |
| Type | Article in Proceedings |
| Conference | Proceedings of ICPIG XXVIII Conference |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Carbon; Oxidation; Optical Properties |
| Description | In this paper we present a study of thickness reduction of an amorphous hydrocarbon (a-C:H) thin film under UV light irradiation. Optical parameters of the film are examined by means of spectroscopic ellipsometry and area reflectance measurement. We observed a linear dependence in thickness reduction. The reduction velocity is 10.1 nm/h in this region. However, if the thickness of the film was less then approx. 14 nm, the reduction velocity decreases subsequently. Area reflectance measurement consisting in taking reflectance spectra in many points lying along the area of the sample is used to create a map with thickness distribution along this area. This method is very sensitive to small thickness variations. |
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