Carbon nanotubes deposition by plasma enhanced chemical vapor deposition

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Authors	JAŠEK Ondřej ELIÁŠ Marek ZAJÍČKOVÁ Lenka KUČEROVÁ Zuzana KUDRLE Vít MATĚJKOVÁ Jiřina REK Antonín BURŠÍK Jiří
Year of publication	2006
Type	Article in Proceedings
Conference	Proceedings Electronic devices and systems 2006 IMAPS CS International Conference
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	carbon nanotubes; plasma enhanced chemical vapor depostion; catalyst; electron microscopy
Description	Carbon nanotube properties provoked interest in many fields of application but there is still need to develop deposition techniques, which enable precise control of nanotubes positioning, alignment and properties. Chemical vapor deposition (CVD) methods and lately also plasma enhanced CVD (PECVD) are most promising to reach this goal. In the first part of the article we will briefly describe carbon nanotubes structure and properties and review the necessary conditions and possible control mechanisms used in PECVD deposition method. In the second part, examples of two deposition techniques, one working at a low pressure and one at an atmospheric pressure, will be described and reached results analyzed.
Related projects:	Synthesis of carbon micro- and nanostructures by plasma technologies Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface