Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization
| Authors | |
|---|---|
| Year of publication | 2006 |
| Type | Article in Periodical |
| Magazine / Source | Journal of Optoelectronics and Advanced Materials |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Thermoionic vacuum arc (TVA); tungsten; thin film; characterization |
| Description | In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We can report that the tungsten film had significantly higher resistance against indentation. |
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