PECVD a opracování povrchu materiálů v nízkotlakých výbojích

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Title in English	PECVD and treatment of surfaces in low pressure discharges
Authors	ZAJÍČKOVÁ Lenka
Year of publication	2005
Type	R&D Presentation
MU Faculty or unit	Faculty of Science
Citation
Description	The presentations covers plasma technologies used for deposition of thin films and treatment of surfaces.
Related projects:	Synthesis of new Si-O(N)-C materials by plasmachemical methods