Electrical Properties of Plasma Deposited Thin Films

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Authors

FRANCLOVÁ Jana KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma

Year of publication 2005
Type Monograph
MU Faculty or unit

Faculty of Science

Citation
Description It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD exhibited Pool-Frenkel conductivity (Schottky conductivity) at lower voltages and Fowler-Nordheim tunneling at higher voltages.
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