Electrical Properties of Plasma Deposited Thin Films

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Authors	FRANCLOVÁ Jana KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma
Year of publication	2005
Type	Monograph
MU Faculty or unit	Faculty of Science
Citation
Description	It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD exhibited Pool-Frenkel conductivity (Schottky conductivity) at lower voltages and Fowler-Nordheim tunneling at higher voltages.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface