Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas

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Authors

ŠMÍD Radek ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma

Year of publication 2005
Type Article in Proceedings
Conference Proceedings of the XXVII ICPIG
MU Faculty or unit

Faculty of Science

Citation
Web http://www.icpig2005.nl/cd/D:/Proceedings_ICPIG_2005.html
Field Plasma physics
Keywords actinometry; HMDSO; optical emission spectroscopy
Description We applied actinometry for the calculation of dissociation degree in oxygen CCP discharges used for the deposition from O2/HMDSO plasmas. Dissociation degree exhibited a slight increase with increasing r.f. power and maximum of 20% for 5 Pa of oxygen. This relatively high value was not enough for deposition of SiO2-like films because the HMDSO percentage in the feed was too high at this low oxygen partial pressure. Rapid decrease of dissociation degree to 2-4% for higher oxygen flow rates, i.e. higher pressures resulted in still insufficient oxidation of film precursors.
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