Raman bands in microwave plasma assisted chemical vapour deposited films

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Authors	KADLEČÍKOVÁ Magdaléna BREZA Juraj VESELÝ Marián FRGALA Zdeněk KUDRLE Vít JANČA Jan JANÍK Ján BURŠÍK Jiří
Year of publication	2003
Type	Article in Periodical
Magazine / Source	Microelectronics Journal
MU Faculty or unit	Faculty of Informatics
Citation
Field	Plasma physics
Keywords	Microwave plasma assisted chemical vapour deposition; Diamond; Raman spectroscopy
Attached files	Raman-bands.pdf
Description	Raman spectroscopy is employed to characterize thin diamond films deposited by microwave plasma assisted chemical vapour deposition technique using a gas mixture of methane and hydrogen. The surface morfology of the films was analyzed by scanning electron microscopy. We have identified submicron crystals on (100) facets of diamond crystals which gave rise to bands in the Raman spectrum centred at 1170 and 1456 cm-1.
Related projects:	Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates