New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

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Authors	OHLÍDAL Miloslav OHLÍDAL Ivan KLAPETEK Petr JÁKL Miloš ČUDEK Vladimír ELIÁŠ Marek
Year of publication	2003
Type	Article in Periodical
Magazine / Source	Japanese Journal of Applied Physics
MU Faculty or unit	Faculty of Science
Citation
Field	Solid matter physics and magnetism
Keywords	films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films
Description	In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.
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