Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

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Authors	ZAJÍČKOVÁ Lenka PEŘINA Vratislav BURŠÍKOVÁ Vilma MACKOVÁ Anna JANČA Jan
Year of publication	2000
Type	Article in Proceedings
Conference	Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate
Description	The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates