The plasma diagnostics of the RF torch discharge plasma chemical system

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Authors

ŠÍCHA Miloš KAPIČKA Vratislav BRABLEC Antonín KLÍMA Miloš SLAVÍČEK Pavel VACULÍK Robert BEHNKE J.F.

Year of publication 2000
Type Article in Proceedings
Conference International Symposium, on High Pressure Low Temperature Plasma Chemistry- HAKONE VII, Greifswald-Germany 2000, Contributed Papers
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Torch discharge plasma; surface treatmnet; plasma diagnostics
Description The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy.
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