The plasma diagnostics of the RF torch discharge plasma chemical system
| Authors | |
|---|---|
| Year of publication | 2000 |
| Type | Article in Proceedings |
| Conference | International Symposium, on High Pressure Low Temperature Plasma Chemistry- HAKONE VII, Greifswald-Germany 2000, Contributed Papers |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Torch discharge plasma; surface treatmnet; plasma diagnostics |
| Description | The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy. |
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