Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	ELIÁŠ Marek ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma JANČA Jan
Year of publication	2000
Type	Article in Periodical
Magazine / Source	Czechoslovak Journal of Physics
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Description	Characterization of CNx/SiOy thin films prepared in the inductively coupled radio-frequency discharge.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings Research and development and industrializartion of novel super hard nanocrystalline materials Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Hard and superhard coatings prepared by unconventional plasma processes Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates