Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge

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Authors

ELIÁŠ Marek ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma JANČA Jan

Year of publication 2000
Type Article in Periodical
Magazine / Source Czechoslovak Journal of Physics
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Description Characterization of CNx/SiOy thin films prepared in the inductively coupled radio-frequency discharge.
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