Technologie pro měření rychlosti růstu vrstvy a ionizace rozprášeného kovu při depozici s velmi vysokým výkonem

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Title in English	Technology for measuring the deposition rate and ionisation of sputtered metal during very high-power deposition
Authors	KLEIN Peter HNILICA Jaroslav VAŠINA Petr
Year of publication	2024
MU Faculty or unit	Faculty of Science
Description	The proposed technology demonstrates reliable performance in measuring the deposition rate and the flow of sputtered metal atoms and ions during direct current magnetron sputtering at very high power levels.
Related projects:	R&D centre for plasma and nanotechnology surface modifications