Vysoceodrazná vrstva na substrátu ve specifikaci R >= 98,5 % @ 248 nm a R >= 98 % @ 213 nm pro úhel dopadu 45.

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Title in English High reflection coating on the glass substrate within two specifications R >= 98,5% @ 248 nm for angle of incidence 45?, and R >= 98% @ 213 nm for angle of incidence 45?.
Authors

PEKAŘ Václav BŘEZINA Jaromír ŠKODA David OHLÍDAL Ivan VOHÁNKA Jiří FRANTA Daniel FRANTA Pavel DVOŘÁK Jan OHLÍDAL Miloslav ŠULC Václav KLAPETEK Petr HAVLÍČEK Marek

Year of publication 2021
MU Faculty or unit

Faculty of Science

Description Implementation of highly reflective layers fitting the requirements for reflectivity in the wavelengths of the deep ultraviolet region, namely 213 nm or 248 nm. The layers for the wavelength of 213 nm were prepared by magnetron sputtering technology using a combination of Al2O3 and SiO2 materials. The layers for the wavelength of 248 nm were prepared by magnetron sputtering using a combination of HfO2 and SiO2 materials. The reflectance parameters reach the values R (213 nm) > 99.5 %, R (248 nm) > 99.3 %.
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