Influence of discharge and substrate parameters on PECVD of TEOS/argon mixtures

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Authors	ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma JANČA Jan
Year of publication	1997
Type	Article in Proceedings
Conference	ICPIG XXIII
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Description	Influence of discharge and substrate parameters on PECVD of TEOS/argon mixtures
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates