Depozice a charakterizace organosilikonových tenkých vrstev ze směsi TEOS+O2
Title in English | Deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture |
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Authors | |
Year of publication | 1995 |
Type | Article in Periodical |
Magazine / Source | Czechoslovak Journal of Physics |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
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