Depozice a charakterizace tenkých vrstev připravených ze směsi TEOS+O2 ve vf plazmatu

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Title in English RF plasma deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture
Authors

JANČA Jan NAVRÁTIL Karel BOCHNÍČEK Zdeněk

Year of publication 1995
Type Chapter of a book
MU Faculty or unit

Faculty of Science

Citation
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