Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface
| Authors | |
|---|---|
| Year of publication | 2022 |
| Type | Article in Periodical |
| Magazine / Source | Plasma Sources Science and Technology |
| MU Faculty or unit | |
| Citation | |
| web | https://doi.org/10.1088/1361-6595/ac4e23 |
| Doi | http://dx.doi.org/10.1088/1361-6595/ac4e23 |
| Keywords | High-frequency and RF discharges; Radio-frequency and microwave measurements |
| Description | Electric characteristics of a discharge are usually changed when a thin film is deposited on or etched from a discharge electrode or a substrate. The electric characteristics include plasma potential, discharge voltage and discharge current, including higher harmonic frequencies of these quantities. This fact can be used for monitoring of various plasma processes, but the mechanism in which the thin film influences the electric characteristics of discharge has not been fully clarified. This work verifies on the example of etching of diamond-like carbon films that variations of electric discharge parameters are caused by variations of electron concentration, which is caused by a difference of the electron emission yield between the DLC film and its substrate. |
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