Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions

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Authors

PŘIBYL Roman KELAROVÁ Štěpánka ZÁBRANSKÝ Lukáš BURŠÍKOVÁ Vilma

Year of publication 2021
Type Article in Proceedings
Conference 12th International Conference on Nanomaterials - Research and Application, NANOCON 2020
MU Faculty or unit

Faculty of Science

Citation
Web https://www.confer.cz/nanocon/2020/3778-comparison-of-hmdso-and-hmdsz-thin-films-growth-under-dusty-plasma-conditions
Doi http://dx.doi.org/10.37904/nanocon.2020.3778
Keywords Thin films; PECVD; dusty plasma; surface properties
Description The present study is focused on the preparation of thin films by plasma enhanced chemical vapor deposition (PEDCV) in capacitively coupled plasma (CCP). Thin films were deposited from a mixture of oxygen and hexamethyldisiloxane (HMDSO) or hexamethyldisilazane (HMDSZ). Both monomers are well known and enable to prepare films with excellent properties such as high hardness, good abrasion resistance, hydrophobicity, and antibacterial properties. Also, these monomers are known for the creation of complex structures in plasma. This phenomenon is so-called dusty plasma. The main aim of the present work was to prepare a comparative study on the dust formation in both monomers. Complex study of surface and mechanical properties and chemical composition was done by a wide range of analytical instruments such as atomic force microscopy (AFM), nanoindentation technique, confocal microscopy, infrared spectroscopy with Fourier transformation (FTIR), stylus profilometer, and surface energy evaluation system (SEE system).
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