Development of plasma enhanced chemical vapor deposition reactor for preparation of oxygen containing organosilazane polymer thin films
| Authors | |
|---|---|
| Year of publication | 2020 |
| Type | Article in Proceedings |
| Conference | 11th International Conference on Nanomaterials - Research & Application (NANOCON 2019) |
| MU Faculty or unit | |
| Citation | |
| Web | https://doi.org/10.37904/nanocon.2019.8749 |
| Doi | http://dx.doi.org/10.37904/nanocon.2019.8749 |
| Keywords | PECVD; nanoindentation; profilometry; confocal microscopy; AFM |
| Description | In the present work we focused on the development of a low pressure capacitively coupled radio-frequency PECVD reactor for preparation of plasma-polymer thin films from organosilazane precursors. The dependence of the film growth from hexamethyldisilazane (HMDSZ, SiN2C6H19) and oxygen containing mixtures on the deposition parameters was studied. The time evolution of the negative self bias voltage on the thin film growth was studied. It was found, that the changes in the self bias voltage significantly influenced the surface structure and the properties of the growing films. The mechanical properties of the films were studied using nanoindentation technique and the surface structure was studied using atomic force microscopy (AFM). |
| Related projects: |