Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture

Investor logo

Warning

This publication doesn't include Faculty of Sports Studies. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

FEKETE Matej BERNÁTOVÁ Katarína HNILICA Jaroslav SOUČEK Pavel KLEIN Peter VAŠINA Petr

Year of publication 2020
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description High power impulse magnetron sputtering (HiPIMS) technology attracts the interest of the industry as the coatings deposited by HiPIMS demonstrate improved properties compared to conventional dc magnetron sputtered (dcMS) coatings. This is because HiPIMS generates very dense plasma, which results in a large fraction of ionized sputtered particles. We report on the HiPIMS with titanium target in the argon atmosphere with an addition of acetylene gas. Such a process can be referred to either as hybrid PVD-PECVD [1] or non-saturated reactive process [2]. The non-invasive method called effective branching fraction method is utilized in order to evaluate the absolute ground state number densities of the sputtered titanium species for various flows of acetylene gas. Further, the HiPIMS process is modelled by a modified Berg model. The presented model incorporates the production of thick carbon layer at the target and the back-attraction of the sputtered titanium ions to the target. The simulated trends agree well with the measured ones.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info