Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

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Authors

KRUMPOLEC Richard HOMOLA Tomáš CAMERON David Campbell HUMLÍČEK Josef CAHA Ondřej KULDOVÁ Karla ZAZPE Raul PŘIKRYL Jan MACAK Jan M.

Year of publication 2018
Type Article in Periodical
Magazine / Source Coatings
MU Faculty or unit

Faculty of Science

Citation
Web https://www.mdpi.com/2079-6412/8/10/369
Doi http://dx.doi.org/10.3390/coatings8100369
Keywords vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure
Description Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.
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